Nanopatterned substrates with < 10 nm features suitable for quantum dot seed layers and low defect density crystal growth on mismatched substrates. For low cost GaN power electronics on sillicon and III-V on silicon for photonic applications.
Foundry serivces are available for patterning to specific device requirements. Applications include short wavelength DFB gratings, custom quantum dot ensembles, and plasmonic arrays can be customized to your application.
Design support is available to develop a solution tailored to your unique requirements. Our engineers can assist you in utilizing nanolithography to push the envelope in your device's performance from monolithic devices to optical and electronic ICs.