Magneton utilizes a unique patterning method, coherent electron lithography, which offers a precision better than standard electron beam or optical lithography while being an inherently parallel and cost effective process.

This breakthrough technique allows for extreme levels of precision not possible by other techniques while simultaneously achieving high throughput. This lithographic technique is also maskless precluding the need for expensive masks and stamp masters as well as enabling rapid and low-cost prototyping. This method is also contactless removing the yield risks of mask and stamp contamination and the cost and complexity of mask and stamp inspection and repair.